Electron Beam Absorbed Current (EBAC) Characterization System nanoEBAC NE4000
The Hitachi NE4000 nanoEBAC is an electron beam based probing system for electrical characterization and EBAC analysis and imaging of microelectronic device interconnects, materials, and components.
Electron Beam Absorbed Current (EBAC) technique offers a quick and effective method to identify open circuits, high resistance and shorts along interconnects without direct probing techniques of lower level layers.
The EBAC technique is performed with the electron beam by passing through the dielectric layers down to the lower level metallization layer in order to absorb the electron beam current. The electron beam accelerating voltage of the FESEM controls the probing depth or penetration level through the dielectric layers. A single probe is placed on the exposed, upper layer metallization to complete the circuit and allow the electrons to flow through the interconnect.
Observation of high resistance and shorts due to Seebeck effect is possible by using dual probes along with the Hitachi patented differential EBAC amplifiers.
User-Friendly Design
Intuitive GUI(Graphical User Interface) with various image and color processing functions.
Coarse positioning of probes are accomplished by an integrated in-chamber CCD camera system.
Premium Image Quality
Provides high quality EBAC images with Hitachi’s patented high performance EBAC amplifiers.
Outstanding Performance
Field Proven, low chromatic aberration, Cold Field Emission (CFE) electron gun for low accelerating voltage imaging and beam damage reduction of the circuit.
High precision nano-probe units.
Advanced Applications
Dedicated nano-probing system with EBAC analysis and electrical characteristics analysis. Large specimen stage can provide fine material and electronics components evaluation.
Specifications
Hitachi Electron Beam Absorbed Current(EBAC) Characterization System nanoEBAC NE4000
Probe unit
Unit number
4
Driving method
Piezoelectric
Fine stroke range
5 µm (X,Y)
Coarse stroke range
6 mm (X,Y)
Specimen stage / Base stage
Specimen size
25 mm × 25 mm × 1 mm thick or less
Traverse position
Measurement / Specimen exchange position
Specimen exchange
Air-locked exchange chamber
Prober navigation
Stage traverse to probe position
Measurement position memory
Probe coarse adjustment
CCD image display
Image display from lateral direction
Electron optics
Electron gun
Cold field emission electron source
Accelerating voltage
0.5 kV to 30 kV
Resolution
15 nm (at 2 kV, WD=15 mm)
Image shift
±150 µm (at 2 kV, WD=15 mm)
EBAC amplifier / Image display
Amplifier type
Current amplifier / Differential amplifier
Image display
SEM / EBAC (Single / Parallel / Overlay)
Image processing
Black and white reversal display, color display, brightness adjustment, slow scan integration, belt scan
Electron Beam Absorbed Current (EBAC) Characterization System nanoEBAC NE4000
The Hitachi NE4000 nanoEBAC is an electron beam based probing system for electrical characterization and EBAC analysis and imaging of microelectronic device interconnects, materials, and components.
Description
Overview
Electron Beam Absorbed Current (EBAC) technique offers a quick and effective method to identify open circuits, high resistance and shorts along interconnects without direct probing techniques of lower level layers.
The EBAC technique is performed with the electron beam by passing through the dielectric layers down to the lower level metallization layer in order to absorb the electron beam current. The electron beam accelerating voltage of the FESEM controls the probing depth or penetration level through the dielectric layers. A single probe is placed on the exposed, upper layer metallization to complete the circuit and allow the electrons to flow through the interconnect.
Observation of high resistance and shorts due to Seebeck effect is possible by using dual probes along with the Hitachi patented differential EBAC amplifiers.
User-Friendly Design
Premium Image Quality
Outstanding Performance
Advanced Applications
Specifications
Hitachi Electron Beam Absorbed Current(EBAC) Characterization System nanoEBAC NE4000
Dimensions and Weight
850 kg
265 kg
Utility requirement
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